| I. INTRODUCTION | | | | 1.9%-doped Nd:YAG, a 0.75-mm layer of |
| Passively Q-switched microchip lasers are simple, | | | | Cr:YAG (6 cm-1), and an 80%R output |
| compact and reliable sources of high repetition rate (1 | | | | facet. The pulse durations calculated for the three |
| to 100 kHz), near-infrared, sub-nanosecond pulses. To | | | | designs were 304, 204 and 200 ps, respectively. We |
| date, low-energy (0.3 to 3 mJ/pulse) and mid-energy | | | | believe that pump-light-induced bleaching is one of the |
| (30 to 180 mJ/pulse) microchip lasers have been | | | | reasons for increasing pulse durations [5]. |
| reported [1] with pulse durations of 200 to 500 ps and | | | | The 0.75-mm Cr:YAG microlaser was used to |
| 650 to 2000 ps, respectively. For some applications, for | | | | construct the oscillator - double-pass-amplifier system. |
| instance, high precision ranging and imaging, | | | | The microchip laser was quasi-cw pumped with a |
| higher-energy pulses, up to 360-440 mJ/pulse [2, 3] are | | | | 1.1-watt peak-power pulse, at a 2 kHz pulse rate. The |
| required with pulse durations approaching 200 ps. The | | | | width of the diode pump pulse was adjusted to ensure |
| pathway to higher pulse energies requires the use of | | | | single-pulse oscillation even when the double-pass |
| higher saturable absorption, which inevitably leads to | | | | amplifier was on. A typical oscilloscope trace of the |
| longer pulse durations. An alternative approach is the | | | | oscillator pulses is shown in Fig. 3. |
| use of a MOPA design with a microlaser oscillator and | | | | With 6.4 mW of microchip laser power, double-pass |
| multipass amplifier [3]. In the only reported work to date | | | | amplifier power was about 670 mW at an amplifier |
| on this approach, a MOPA system operated in the | | | | current of 31A. The beam quality of the |
| 10-m J range, producing 500-ps pulses [4]. | | | | double-pass-amplified beam was measured (by the |
| We present here a MOPA system generating 335 m | | | | Spiricon M2 meter) using the "90/10 knife-edge" |
| J at 1064 nm with efficient harmonic conversion to the | | | | method. M2 in the horizontal and vertical planes was |
| visible and UV. At all wavelengths, the pulse durations | | | | measured to be 1.38 and 1.28, respectively. The pulse |
| were <400 ps. This source is a valuable tool for | | | | durations decreased to 370 ps as compared to ~ |
| applications that include ranging, LIDAR, micro-materials | | | | 440-ps from the microlaser. |
| processing, and UV spectroscopy in chemistry and | | | | |
| biochemistry. | | | | |
| II. SYSTEM DESCRIPTION AND EXPERIMENTAL | | | | Fig. 3. Oscilloscope trace of 440-ps oscillator pulse. |
| RESULTS | | | | |
| Figure 1 shows a | | | | |
| schematic layout of our MOPA system. A 1-watt, | | | | |
| fiber-coupled diode laser operated at a 2 kHz pulse | | | | |
| rate is used as a pump source for the Cr:YAG | | | | |
| passively Q-switched Nd:YAG microlaser. Pump light | | | | Table 1. Microlaser characteristics. |
| emerging from the 100-m m, 0.22 NA fiber is collected | | | | Microlaser parameters |
| and focused into the microchip using two AR-coated | | | | Microlaser # 1, 4:3 telescope |
| aspheric lenses. The fiber ispositioned at the front focal | | | | Microlaser # 2, 2:1 telescope |
| plane of the first lens, and the microchip at the nominal | | | | Microlaser # 3, 4:3 telescope |
| back focal plane of the second lens. Two different | | | | Average power, mW |
| "telescopes" were used to optimize the microlaser | | | | 4.4 |
| output: a 4:3 or a 2:1 reducing telescope. Approximately | | | | 3.1 |
| 98% of the light emerging from the fiber is | | | | 6.4 |
| delivered to the microchip when using either telescope. | | | | Pulse energy, m J |
| The microchip laser output is collected by a spherical | | | | 2.2 |
| 50-mm FL lens. This lens is typically positioned about | | | | 1.55 |
| 63 mm from the microchip so the beam is gradually | | | | 3.2 |
| focused into the amplifier stage. The beam then | | | | Pulse width, FWHM, measured, ps |
| passes through a TGG Faraday isolator equipped with | | | | 700 |
| input and output Glan-laser polarizers. | | | | 400-440 |
| A half-wave plate positioned before the collimator lens | | | | 400-440 |
| adjusts the polarization angle of the microchip beam | | | | Delay, m sec |
| as it enters the first polarizer of the isolator. A second | | | | 90 |
| half-wave plate adjusts the polarization angle of the | | | | 40 |
| beam emerging from the second polarizer. The beam | | | | 70 |
| is turned 90° by the first 45° -incidence HR (45 HR), | | | | Pump pulse width, m sec |
| goes through a +150 mm FL cylindrical lens that | | | | 120 |
| focuses in the vertical plane, and bounces off the | | | | 60 |
| second 45 HR, before entering the 3-pass amplifier | | | | 120 |
| stage. | | | | Jitter, ns |
| The cylindrical lens is positioned about 150 mm from | | | | ± 100 |
| the center of the amplifier slab, taking into account the | | | | ± 100 |
| fact that the beam makes three passes through the | | | | ± 100 |
| slab (the separation between the slab assembly’s | | | | Drift, 5 min, ns |
| miniature fold mirrors is about 20 mm, and the slab is | | | | ± 300 |
| about 15 mm long). The beam is back-reflected | | | | ± 200 |
| through the amplifier with a flat HR , and makes | | | | ± 200 |
| another 3 passes through the amplifier slab. | | | | We have also conducted experiments on nonlinear |
| The back-reflected, double-pass amplified beam | | | | conversion of the amplifier beam. For second harmonic |
| passes back through the optical system and into the | | | | generation (SHG) we used a |
| Faraday isolator. The plane of polarization at the first | | | | non-critically-phase-matched, Type I LBO crystal, with |
| polarizer is now rotated 90° relative to the microchip | | | | dimensions of 3 x 3 x 15 mm, mounted in a 1700 C, |
| laser polarization. The double-pass-amplified beam is | | | | temperature-stabilized oven. Third harmonic generation |
| coupled out the system at the first polarizer, and | | | | (THG) at 355 nm was accomplished with a |
| emerges with a polarization vertical to the plane of the | | | | room-temperature, 3 x 3 x 12 mm, Type II |
| paper. | | | | critically-phase-matched LBO crystal (q = 42.7° , f = |
| | | | | 90° ). And, finally, for fourth harmonic generation |
| | | | | (4HG) at 266 nm, a Type I critically-phase-matched, |
| Fig. 1. Schematic layout of the Microlaser-Amplifier | | | | room-temperature BBO crystal (q = 47.6° , f = 0° ), |
| system. | | | | 3 x 3 x 7 mm crystal was used. The beams were |
| Our amplifier gain material, Nd:YVO4, is particularly well | | | | separated using a Pellin-Broca prism. At input power of |
| suited for amplifying pulses with energies below 100 m | | | | 670 mW, the output power of SHG, THG and 4HG |
| J because of its extremely high gain. This is | | | | was 400, 240 and 86 mW, respectively, which |
| demonstrated by Fig. 2, where we present calculated | | | | corresponds to ~ 60%, 36%, and |
| double-pass gain curves for cw-pumped multi-pass | | | | 13% conversion efficiency. |
| slab amplifiers based on different Nd-doped materials. | | | | III. CONCLUSION |
| The amplifier design employs a slab-geometry gain | | | | We have designed and constructed a highly efficient |
| module with transverse pumping. The gain module | | | | diode-pumped, short-pulse, energetic, compact and |
| consists of an a-axis-cut, 2-mm high by 3-mm wide by | | | | reliable microlaser-amplifier system. This design |
| 15-mm long Nd:YVO4 slab. The slab was cw | | | | approach, we believe, will allow us to achieve even |
| side-pumped by two 20-W diode laser bars emitting at | | | | shorter (~ 200 ps) and higher-energy pulses, increase |
| 808 nm, with top and bottom heatsinking. The side | | | | the conversion efficiencies of harmonic generation, and |
| faces of the slab are polished and antireflection | | | | improve the compactness of the system. |
| coated at 808 nm for maximum coupling of the pump | | | | |
| light. The outputs of the diode laser arrays are | | | | |
| collimated, in the highly diverging direction, by a drawn | | | | |
| aspheric cylinder lens to produce a nearly rectangular | | | | |
| excitation region in the laser crystal. The laser mode is | | | | REFERENCES |
| passed three times through the length of the excitation | | | | 1. J. J. Zayhowski, "Passively Q-switched microchip |
| region, using a pair of miniature external mirrors, | | | | lasers and applications," Rev. Laser Eng., v. 26, pp. |
| essentially transverse to the pump beam. This design | | | | 841-846 (2008). |
| allows for efficient extraction of the stored energy in a | | | | 2. J. J. Zayhowski, C. Dill III, C. Cook, J. L. Daneu," Mid- |
| TEM00-mode beam. | | | | and high-power passively Q-switched microchip |
| | | | | lasers," in OSA Trends in Optics and Photonics on |
| Fig. 2. Calculated double-pass gain curves for | | | | Advanced Solid-State Lasers, v. 26, M. M. Fejer, H. |
| cw-pumped Nd-doped multi-pass slab amplifiers. | | | | Injean, and U. Keller (eds), (Optical Society of America, |
| Three different monolithic microchip oscillator designs | | | | Washington DC, 2007) pp. 178-186. |
| were evaluated, each having a different Cr:YAG layer | | | | 3. J. J. Degnan, "Optimal design of passively |
| thickness. The first two designs were made by | | | | Q-switched microlaser transmitters for satellite laser |
| Synoptics according to Q-Peak specifications. Both | | | | ranging," in Proceeding of 10-th International Workshop |
| employ a 0.5 mm thick layer of 3%-doped | | | | on Laser Ranging, Shanghai, PRC, 2006, pp. 334-343. |
| Nd:YAG. One chip design has a 0.25-mm-thick layer of | | | | F. Druon, F. Balembois, P. Georges, A. Brun, "Compact |
| Cr:YAG with a nominal unsaturated absorption of 6 | | | | high-repetition-rate pulsed UV sources using |
| cm-1. The output facet of the chip is coated for | | | | diode-pumped microchip laser and multipass amplifier," |
| 80%R. The other chip design is the same, | | | | in Advanced Solid-State Lasers, OSA Technical Digest |
| except that the Cr:YAG layer thickness is 0.5 mm. | | | | (Optical Society of America, Washington DC, 2008), |
| Originally, we intended to try a similar third design, but | | | | pp. 329-331. |
| with a 0.75 mm Cr:YAG layer and a 60%R | | | | M. A. Jaspan, J. A. Russell, D. Welford, "Degradation of |
| output facet. However, this chip was not coated | | | | passively Q-switched microlaser performance due to |
| properly and was replaced with an off-the-shelf chip | | | | pump-light induced bleaching of the saturable absorber," |
| designed by Synoptics, which had features close to | | | | to be submitted to Opt. Letters. |
| what we desired. This chip has a 1.25 mm layer of | | | | |